Chemical vapor deposition CVD coating equipment

In the vacuum state, various gas discharge methods are introduced into the field of gas deposition, and the whole process of gas deposition is carried out in plasma. It not only can carry on the coating on the metal product surface, but also can carry on the coating on the non-metal product surface. Can be coated with metal film. Titanium nitride, titanium carbide, zirconium nitride, chromium nitride, titanium oxide and other film layers. All SUS304 high-quality stainless steel body, hidden double-layer cooling water jacket design. The stability and uniformity of arc source sputtering can be effectively ensured by rationally equipping many sets of newly developed ion arc sources. Multi-way air intake system, accurate control of gas flow, to meet your needs of a variety of compound film. Combined with pulse bias technology, the energy of electric particles is greatly increased, thus obtaining excellent film adhesion and finish. The equipment is widely used in: hardware products, glass crafts, ceramic crafts, such as sanitary ware products, watches, watches, knives, molds, crystal glass, golf clubs, lamps, glasses frame, tile floor tiles and so on. Machinable materials include: stainless steel, copper, iron, zinc alloy, aluminum, ABS, glass, ceramics and so on. Plating substrate surface state: ordinary plating bright surface, dumb surface (semi-dumb, full-dumb) , process plating wrinkles, wire drawing, Raindrops and so on. Plating color: translucent, gold, silver, rose gold, black, green, blue, purple, colorful, TiN, ZrN, Tialn, TiC, TICN, CRN, Al2O3 and so on.